CU Boulder researchers have built high-performing optical microresonators, opening the door for new sensor technologies. At ...

It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter ...

Researchers in the Harvard John A. Paulson School of Engineering and Applied Sciences (SEAS) and the Faculty of Arts and ...

IBM develops an optical lithography technique capable of producing structures less than 32 nm in size which its says gives the industry seven years of breathing space. Scientists at IBM say they have ...

This article presents a method for developing elastic nanoarchitected metamaterials with tunable optical responses.

In a recent study published in Science, a group of Researchers at the University of Chicago, in collaboration with the Argonne National laboratory, have recently developed a novel method they termed ...

Given that the alternatives all have challenges, it looks to me that optical lithography will have to deliver the 16 nm and most likely the 11 nm node. In my last blog, I reviewed the news from SPIE’s ...

Caltech scientists have developed a way to guide light on silicon wafers with low signal loss approaching that of optical fiber at visible wavelengths. This accomplishment paves the way for a new ...

IBM announced last month that it had fabricated the smallest high-quality line patterns ever created by optical lithography. Jacqueline Hewett spoke to the researchers involved to find out how they ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...