An unsatisfying compromise has to be made between acceptable throughput and sufficient data coverage when measuring high-slope machined parts, since metrology tools usually involve some sort of ...

Non-destructive and accurate characterization of high aspect ratio (HAR) and composite micro-trenches is essential for semiconductor inspection in fields like microelectromechanical systems (MEMS) and ...

Surface metrology has to increasingly deal with the presence of sub-micron thick films, which are now being used on products well beyond semiconductor devices. Sub-micron films may be incidental – for ...

(Nanowerk News) Optical measurement techniques collecting light intensity in the far-field such as conventional and confocal microscopy or coherence scanning interferometry (CSI) enable fast and ...

An unproductive settlement has to be made between satisfactory throughput and adequate data coverage when measuring high-slope machined components. This is because metrology tools involve some type of ...

A technique called plasmonic interferometry helps to detect spatial coherence in 'incoherent' light. A technique called plasmonic interferometry helps to detect spatial coherence in 'incoherent' light ...